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´ë±â¾Ð PLASM TREATMENT SYSTEM
| LAY-OUT | ITEM | DESCRIPTION |
|---|---|---|
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System Composition | Process Module |
| Substrate Size | Max. 200x200mm, 1set | |
| Plasma Source | RF Power Supply |
GRAPHEEN FORMAL SYSTEM
| LAY-OUT | ITEM | DESCRIPTION |
|---|---|---|
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System Composition | Quartz Tube ~¨ª150 |
| Substrate Size | ~4inch Wafer Set | |
| Heating Chamber | Furnace + Halogen Lamp Chamber | |
| Substrate Temperature | ~Max. 1000¡É | |
| Heating Source | Halogen Lamp + SiC Heater |
¾ß¿Ü RTP SYSTEM
| LAY-OUT | ITEM | DESCRIPTION |
|---|---|---|
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System Composition | Process Module + Camera Module |
| Application/td> | RTP System | |
| Heating Source | Halogen Lamp | |
| Substrate Temperature | ~Max. 300¡É |





