열처리장치
열처리장치 Images
RAPID THERMAL PROCESS SYSTEM
| LAY-OUT | ITEM | DESCRIPTION |
|---|---|---|
 |
System Composition | Process Module |
| Substrate Size | ~8inch | |
| Heating Source | Halogen Lamp | |
| Max. Heating Temperature | ~1000℃ |
RAPID THERMAL ANNEALING SYSTEM
| LAY-OUT | ITEM | DESCRIPTION |
|---|---|---|
 |
System Composition | Process Module |
| Substrate Size | ~8inch Wafer 1 Set | |
| Heating Source | Halogen Lamp | |
| Max. Heating Temperature | ~Max. 1100℃ |
